高數值孔徑晶片製造
Intel 使用High NA EUV量產商用晶片
高數值孔徑（High NA）芯片製造技術，正透過將次世代光刻技術引入商業規模生產，推動半導體製造向前邁進。英特爾晶圓代工廠（Intel Foundry）已開始運用 ASML 的高數值孔徑極紫外光（EUV）光刻技術，生產部分 Intel Core Ultra Series 3 處理器，實現基於 Intel 18A 製程、先進芯片更精準的圖案化製程。此技術提升製造精準度，同時支援更高的晶體管密度及更佳的製程控制，有助為專為 AI、高性能運算及其他高負荷應用而設計、日益強大的處理器鋪路。
對芯片製造商而言，高數值孔徑 EUV 技術，可透過降低圖案化製程複雜度、支援未來製程規模化，提升生產效率。於大規模生產中率先部署，亦讓企業可於將此技術擴展至更多產品及製造節點之前，精進生產工作流程。隨著 AI 運算需求持續加速增長，先進光刻技術，正成為以商業規模生產更強大、更節能半導體的關鍵能力。
英文原文
High NA chip manufacturing is advancing semiconductor production by bringing next-generation lithography into commercial-scale manufacturing. Intel Foundry has begun producing select Intel Core Ultra Series 3 processors using ASML's High NA extreme ultraviolet (EUV) lithography, enabling more precise patterning for advanced chips built on the Intel 18A process. The technology improves manufacturing accuracy while supporting higher transistor density and greater process control, helping pave the way for increasingly powerful processors designed for AI, high-performance computing and other demanding applications.
For chip manufacturers, High NA EUV can improve production efficiency by reducing patterning complexity and supporting future process scaling. Early deployment in high-volume manufacturing also allows companies to refine production workflows before expanding the technology to additional products and fabrication nodes. As demand for AI computing continues to accelerate, advanced lithography is becoming a critical capability for producing more powerful, energy-efficient semiconductors at commercial scale.
- 來源
- Trend Hunter
- 發布
- 2026-07-29
- 品類
- Computers
- 出處
- naturalnews, asml